OEM Group is proud to partner with Fourth-Rite Technology to provide the TRACE-RITE® RF Endpoint Detection system. TRACE-RITE® provides real time RF-based endpoint detection for either plasma etch or deposition chamber clean. It is designed to deploy and operate autonomously within the manufacturing environment by communicating directly with the process tool to detect and signal endpoint. TRACE-RITE® provides an array of communication protocols to readily integrate with tools used in the semiconductor, FPD and solar manufacturing industries.

TRACE-RITE® leverages the SENSE-RITE® measurement platform, operating at the point-of-use of delivered power over the wide range of process powers commonly used by plasma-based process tools.

• Endpoint Signal Generation
• Endpoint Detection
• Data Storage
• LAN Ready
• Tool Health Monitoring

Designed to correct:
• Erratic on-wafer particle performance
• Over cleaning leading to chamber kit wear
• High particle levels due to incomplete cleaning
• High particle levels due to over cleaning
• Excessive clean gas emissions
• Excessive clean gas usage
• Reduced tool throughput
• Increased PM frequency causing decreased tool availability

Features & Benefits Include:
Optimization Process
• Reduces PFC gas usage up to 50% without extending the overall cleaning time
Real-time RF-based endpoint detection
• Operates autonomously within the manufacturing environment
• Communicates directly with the process tool to detect and signal endpoint
Display strong signal transitions
• Changes reflect changes in the state of the process chamber
Multiple algorithm and scaling options
• Makes endpoint detection repeatable and reliable

Trace-Rite enables a more environmentally conscious operation along with significant cost savings through:
• Clean time reduction
• Gas usage optimization
• Trace-Rite® end point detection typically:
• Saves 10 to 50% of conventional clean times
• Enables overall C2F6 usage to be reduced up to 50%