Mattson™ Aspen II CVD

The Mattson CVD system uses the same standard mainframe as the Mattson Aspen Ash. It is available as a single- chamber or a two-chamber configuration. Each chamber processes four wafers at a time providing high throughput with a small footprint. The system also features an in situ cleaning cycle that automatically cleans the chamber after each batch of wafers resulting in reduced downtime in production.

Applications
• Oxide
• Nitride
• TEOS
• Fluorinated TEOS