Mattson™ Aspen II Ash & CVD Systems

OEM Group offers Mattson Aspen II systems custom built to “like new” condition complete with new state-of-the-art components, a warranty that is the same as the Original Equipment Manufacturer, and upgrades designed to greatly improve system performance.

With the capability of processing up to four wafers simultaneously in its two chamber dual wafer Strip systems, and up to eight wafers simultaneously in its two chamber quadruple wafer CVD systems the Mattson Aspen II Platform provides:
• High throughput
• Savings in clean room floor space
• Continuous processing
• Lower overall CoO

Mattson™ Aspen II Ash   Mattson™ Aspen II CVD
 

Expertise in the following processes:
• Diode
• Triode
• ICP
• ICP-sm
• ICP Lite Etch

 

Expertise in the following processes:
• Oxide
• Nitride
• TEOS
• Florinated TEOS