Mattson Aspen II Introduction

OEM Group offers a remanufacturing solution to provide customers with a Mattson Aspen II system that has been custom built to “like new” condition complete with new state of the art components, a warranty that is the same as the Original Equipment Manufacturer, and upgrades designed to greatly improve system performance.

With the capability of processing up to four wafers simultaneously in it’s two chamber dual wafer Strip systems, and up to eight wafers simultaneously in it’s two chamber quadruple wafer CVD systems the Mattson Aspen II Platform provides:
• High Throughput
• Savings in Cleanroom Floorspace
• Continuous Processing
• Lower Overall COO

Mattson Aspen II Strip
 
Expertise in the following processes:
• Diode
• Triode
• ICP
• ICP-sm
• ICP Lite Etch
Mattson Aspen II CVD
 
Expertise in the following processes:
• Oxide
• Nitride
• TEOS
• Florinated TEOS